The water yield analysis application is used by leading micro-chip manufacturers throughout the world to improve the profitability of their fabrication facilities. The application is comprised of a wafer scanning device that collects defect information, a server to manage information collected from the entire facility, and wafer yield analysis software. 

Solution : PSA has had significant involvement in the development of the GUI wafer yield analysis software. The wafer yield analysis software is a Windows based application that includes features such as charting, 2D and 3D graphics, data tables, and printing. PSA has implemented the functionality for the 2D and 3D graphics, data tables and printing capabilities.Implement many features improving analysis and user friendliness within the GUI. Provide new enhancements to handle charting, 2D & 3D Graphics, Data Tables and Printing.PSA also ported the existing software V 3.x from Microsoft Windows 3.1 to Motif on HP UX 9.05 and 10. PSA provided maintenance and custom enhancement requests for the software versions from 3.5 to 5.2.

Tools : Zinc, MFC, Microsoft Visual C++, Oracle, Bounds Checker, and PVCS.

The image browser is an application that allows you to view and browse wafer chip images. 

Solution : PSA was responsible for porting the image browser application software from Microsoft Windows 3.1 to Motif on HP UX 9.05. 

Tools : C++, Microsoft Windows 3.1, Zinc, PVCS, Rouge Wave and Presentation Graphics, Motif, HP-UX9.05

Statistical Process Control (SPC) is a software option which allows users of semiconductor manufacturing tools to gather process data over a period of time and use it to analyze and understand machine performance trends.

Solution : The scope of work included software enhancements to the SPC software, which include adding modifications to the display and printing of graphs, such as adding machine id, date range, and recipe, and adding an X library key/legend to the printout of a chart, change the resolution of data points. In addition, modifications were made to the alarms and error handling for the SPC software.

Tools : C, Motif, X Toolkit and Motif libraries, Perl, ClearMake, XRT/Graph for Motif, UNIX

This application allowed operators and plant management to view, monitor, and control semiconductor manufacturing equipment in their facility from any authorized remote workstation.

Solution : Provided a means of monitoring and controlling a specified industrial tool from a remote workstation. One important aspect of this project was that the workstation and the tool can be running with either SunOS or Solaris operating systems. Using Java as the cross platform environment, PSA developed a complete graphical user interface (GUI), client functions and list maintenance functions.

Tools : Perl, Java, JDK 1.3, Forte, JVM, SunOS, Solaris, GNU C/C++ compiler, SCCS, Motif, X Windows, TCP/IP protocol